• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
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  • 优先权
    • 专利摘要:
    The present invention relates to a method of decorating, by a filler material (5) according to a predefined pattern, a covering component in watchmaking or in jewelry comprising a substrate (1), the method comprising the following steps: a . depositing at least one sacrificial layer (2, 3) on the substrate (1); b. etching recesses (4) in the substrate (1) according to the predefined pattern through said sacrificial layer (2, 3); vs. depositing the filler material (5) on said substrate (1) and the sacrificial layer (2, 3); d. removing said sacrificial layer (2, 3) by means of a selective chemical attack.
    公开号:CH715191A2
    申请号:CH00899/18
    申请日:2018-07-20
    公开日:2020-01-31
    发明作者:Le Boudouil Damien；Netuschill Alexandre
    申请人:Comadur Sa；
    IPC主号:
    专利说明:

    Description Object of the invention The present invention relates to a method of decorating a covering component in watchmaking or in jewelry.
    Technological background The present invention aims to improve the methods of depositing decorative patterns on the surface of a timepiece component. In particular, the present invention aims to propose a method for depositing a decoration obtained by deposition of a thin layer of PVD (Physical Vapor Deposition, or physical vapor deposition) type according to a defined pattern whose surface condition is different from that of the component. For example, a polished black ceramic bezel with a matte timer on which a gray PVD layer is deposited.
    According to the prior art, this type of decorative deposit is obtained by a PVD deposit followed by removal of the PVD layer by a mechanical process outside of the matt areas. This technique requires a significant height difference between the two surface states to avoid damaging the layer in the matt part during the mechanical removal operation of the layer in the polished area, the tool being able to come into contact with the matt area. .
    Alternatively, it is possible to structure the PVD layer using a mask or a selective polymerization technology that aligns with the matt area. However, it is difficult to achieve perfect alignment of the mask with the matt area. This technique generally leaves a matt area not covered by the PVD layer.
    权利要求:
    Claims (13)
    [1]
    Summary of the invention [0005] The present invention relates to a method of decorating, by a filler material according to a predefined pattern, a covering component in watchmaking or in jewelry comprising a substrate, the method comprising the following steps :
    at. depositing at least one sacrificial layer on the substrate;
    b. etching recesses in the substrate according to the predefined pattern through said sacrificial layer;
    vs. deposit the filler material on the sacrificial layer or on an additional layer covering the sacrificial layer;
    d. removing said sacrificial layer by means of selective chemical attack.
    Preferably, a photoresist mask having holes aligned with the recesses is added after the etching of the sacrificial layer and before the deposition of the filler material. Advantageously, the holes aligned on the recesses are of dimensions slightly greater than the dimensions of the recesses.
    Advantageously, the substrate is made of a slightly ductile material. It can, for example, be a ceramic, sapphire, ruby, etc. Preferably, it is a ceramic and, more preferably, a zirconia.
    Preferably, which the sacrificial layer comprises a metallic layer, preferably gold.
    Advantageously, the sacrificial layer comprises an adhesive layer preferably comprising titanium.
    Preferably, the selective chemical attack is a liquid attack, said liquid advantageously comprising aqua regia, cyanide, lodide and / or hydrofluoric acid.
    Preferably, the etching of the recesses is carried out by a laser etching process making it possible to etch the sacrificial layer and the substrate.
    Advantageously, the deposition of the filler material is an anisotropic vapor phase deposition (PVD, evaporation under vacuum, pulsed laser ablation).
    Preferably, the substrate is polished before the deposition of the sacrificial layer.
    Advantageously, the filler material is selected from the group consisting of CrN, ZrO 2 , Cr, Ti, Au, ZrN.
    In cases where the filler material is gold or titanium, the material of the sacrificial layer must be adapted to allow a selective attack.
    Brief description of the figures
    Figs. 1a to 1e represent the successive stages of a preferred example of a decoration process according to the invention.
    Fig. 2 shows a covering component, and, in particular, a watch bezel decorated with the method according to the invention.
    Figs. 3d to 3g represent steps of a preferred mode of the process of the invention.
    Detailed description of the invention The present invention provides a method of depositing a decorative pattern on a covering component in watchmaking or in jewelry by physical vapor deposition (PVD). The covering component 6 can in particular be a bezel, a dial, a box, a crown, a push-piece, a crystal, a bracelet element, etc. By way of example illustrated in FIG. 2, the component 6 is a watch bezel comprising an annular body constituting the substrate 1 decorated with indices forming the decorative pattern 5.
    The method of the invention comprises a first step in which a sacrificial layer 2, 3 is deposited on the substrate 1 of the timepiece component, as shown in FIG. 1b. This sacrificial layer 2, 3 is intended to be removed by a selective chemical attack in a later step. It is therefore selected so that it can be chemically removed without degrading the substrate or the deposit. In particular, the selective attack on the sacrificial layer must not modify the surface state of the areas on which the PVD deposit is not made. According to a preferred embodiment of the invention, the substrate is polished zirconia. In this case, the sacrificial layer is advantageously a continuous gold layer 3, for example deposited by evaporation under vacuum. The selective chemical attack is then advantageously carried out by a cyanide-based stripper. The thickness of this layer must be sufficient to allow attack by the edge of the layer. This layer will therefore preferably have a thickness of between 50 and 250 nm.
    To improve the mechanical stability of the interface between the sacrificial layer 3 and the substrate 1, an adhesive intermediate layer 2 is advantageously deposited before the sacrificial layer 3 proper. Titanium generally exhibits adequate adhesion to most common substrates. The titanium layer can be removed by attack with hydrofluoric acid. The thickness of this layer can be extremely small: a few nm are generally enough to considerably improve adhesion. A very small thickness has the advantage of reducing the chemical attack time allowing this layer to be removed. The substrate 1 covered with the sacrificial layer 2, 3 is then etched according to the desired pattern. After this step, a substrate 1 is therefore obtained comprising recesses 4 arranged according to the desired pattern. These recesses 4 pass through the sacrificial layers and extend into the substrate as shown in FIG. 1 C. The depth of these recesses 4 in the substrate 1 is preferably at least equal to the thickness of the planned PVD deposit 5. The etching process must be both directional and not very selective since it must etch both the substrate 1 and the sacrificial layer (s) 2, 3.
    Advantageously, the etching of the hollows 4 is carried out by a laser process which makes it possible to easily control the etched pattern, to make the hollows 4 having walls essentially perpendicular to the surface of the substrate 1, to quickly etch many parts, and finally, to fine-tune the surface condition of the engraved area. Alternatively, an ion beam can also be used, although more complex to use.
    Then, during a PVD deposition step shown in FIG. 1 d, a filler material 5 is deposited over the entire surface of the component to be decorated. The thickness of the deposited layer is typically of the order of 0.1 to 2 μm. The thickness of the filler layer 5 is essentially constant. Advantageously, the deposition is a directional deposition, leaving the walls of the recesses 4 free above the deposited layer. For example, the deposition can be carried out by vacuum evaporation, by sputtering of a cathode of suitable composition or even by ablation of a target by a pulsed laser.
    The decorative layer is for example a mat material having a high contrast with the substrate. For example, it may be a deposit of matt gray chromium nitride on a polished black zirconia substrate. Advantageously, the deposition of the decorative layer 5 leaves the edge of the sacrificial layer free.
    In the next step, shown in fig. 1 e, a selective chemical attack removes the sacrificial layer (s) 2,3, revealing the areas outside the free recesses 4. In fact, the removal of the sacrificial layer under the deposit 5 eliminates the adhesion of the latter to the substrate outside the recesses 4.
    In the example mentioned in which the filler material is CrN deposited on a black zirconia substrate, an adequate sacrificial layer is a titanium / gold bilayer, with a titanium thickness of the order of 1 to 50 nm and a layer of gold of thickness between 50 and 200 nm, the attack on the Au layer being made by means of a cyanide-based stripper. If necessary, an attack with hydrofluoric acid makes it possible to remove the residues of Tl. Other possible combinations include for example zirconia of different colors, for example a polished black zirconia for the substrate and a matt white zirconia for the decorative deposit .
    As shown in Figures 3d to 3g, to reduce edge effects, it may be useful to add a mask 8 of photoresist 7 before the deposition of the filler material 5. This photoresist 7 is first deposited in a continuous layer as shown in fig. 3d. It is then irradiated (generally not UV) according to a pattern corresponding to that of the recesses 4. Depending on whether it is a positive or negative resin, the irradiated or non-irradiated parts are then dissolved, again revealing the recesses 4. Advantageously, the pattern of the mask 8 reveals a narrow margin 9 at the edge of the recesses as shown in FIG. 3rd. The filler material is then deposited in a layer of constant thickness (fig. 3f) as in the absence of a mask. Finally, the mask 8 is dissolved, revealing the sacrificial layer 3 (fig. 3g). The process then resumes as in the absence of a mask.
    Numerical references of the figures [0026]
    1 substrate
    [2]
    2 adhesive layer
    [3]
    3 sacrificial layer
    [4]
    4 recess
    [5]
    5 decorative pattern or filler material
    [6]
    6 covering component
    [7]
    7 Photoresist
    [8]
    8 Mask
    claims
    1. A method of decorating with a filler material (5) according to a predefined pattern of a cladding component in watchmaking or in jewelry comprising a substrate (1), the method comprising the following steps:
    at. depositing at least one sacrificial layer (2, 3) on the substrate (1);
    b. etching recesses (4) in the substrate (1) according to the predefined pattern through said sacrificial layer (2, 3);
    vs. depositing the filler material (5) on the substrate (1) and the sacrificial layer (2, 3);
    d. removing said sacrificial layer (2, 3) by means of a selective chemical attack.
    2. Method according to claim 1, wherein the substrate (1) is made of a material chosen from ceramic, sapphire, ruby, steel, titanium, gold alloys, platinum alloys and their mixtures .
    3. Method according to claim 1 or 2, wherein the substrate (1) is made of a ceramic based on zirconia.
    4. Method according to one of the preceding claims, wherein the sacrificial layer (2, 3) comprises a metallic layer, preferably gold.
    5. The method of claim 4, wherein the selective chemical attack is a wet attack.
    6. The method of claim 5, wherein said liquid advantageously comprises aqua regia, cyanide, lodide and / or hydrofluoric acid.
    7. Method according to one of the preceding claims, in which the sacrificial layer (2, 3) comprises an adhesive layer (2) preferably comprising titanium.
    8. Method according to one of claims 1 or 2, wherein the filler material (5) is selected from the group consisting of CrN, ZrO 2 , Cr, Au, Tl, ZrN and their mixtures.
    [9]
    9. Method according to one of the preceding claims, in which the etching of the recesses (4) is carried out by a laser etching process making it possible to etch the sacrificial layer (2, 3) and the substrate (1).
    [10]
    10. Method according to any one of the preceding claims, in which the deposition of the filler material (5) is an anisotropic vapor deposition.
    [11]
    11. Method according to one of the preceding claims, in which the substrate (1) is polished before the deposition of the sacrificial layer (2, 3).
    [12]
    12. Method according to one of the preceding claims in which a photoresist mask (8) having holes aligned on the recesses (4) is added after the etching of the sacrificial layer (2, 3) and before deposition filler material (5).
    [13]
    13. The method of claim 12 wherein the holes aligned on the hollows are slightly larger than the dimensions of the hollows.
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    同族专利:
    公开号 | 公开日
    CH715191B1|2022-01-14|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    CH00899/18A|CH715191B1|2018-07-20|2018-07-20|Process for decorating a watch exterior component.|CH00899/18A| CH715191B1|2018-07-20|2018-07-20|Process for decorating a watch exterior component.|
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